Thin Film - List of Manufacturers, Suppliers, Companies and Products | IPROS

Last Updated: Aggregation Period:Mar 11, 2026~Apr 07, 2026
This ranking is based on the number of page views on our site.

Thin Film Manufacturer, Suppliers and Company Rankings

Last Updated: Aggregation Period:Mar 11, 2026~Apr 07, 2026
This ranking is based on the number of page views on our site.

  1. フロロテクノロジー Aichi//others
  2. null/null
  3. KGK 共同技研化学 埼玉県所沢本社・工場、群馬県富岡工場、東京都池袋事業所 Saitama//Building materials, supplies and fixtures manufacturers
  4. Tohoku Techno Arch Co., Ltd. Miyagi//Educational and Research Institutions
  5. null/null

Thin Film Product ranking

Last Updated: Aggregation Period:Mar 11, 2026~Apr 07, 2026
This ranking is based on the number of page views on our site.

  1. Acid-resistant coating agent that works just by applying; free of regulated substances; transparent thin film. フロロテクノロジー
  2. 2021 Edition: Current Status and Outlook of Next-Generation Functional Films
  3. Thin film, strong adhesive PET substrate double-sided tape "400P" series KGK 共同技研化学 埼玉県所沢本社・工場、群馬県富岡工場、東京都池袋事業所
  4. Tohoku University Technology: High Mobility ZnO Thin Film on Transparent Film Using Electron Beams Tohoku Techno Arch Co., Ltd.
  5. 4 Tohoku University Technology: Polycrystalline Heusler alloy thin film: T20-2968 Tohoku Techno Arch Co., Ltd.

Thin Film Product List

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Thin film, strong adhesive PET substrate double-sided tape "400P" series

Strong adhesion, good processability PET substrate double-sided tape

High reliability adhesive strength Resilience and curve-following capability High dimensional stability and good machinability

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Tohoku University Technology: High Mobility ZnO Thin Film on Transparent Film Using Electron Beams

Flexible transparent electrodes can be made inexpensively with ZnO (zinc oxide)!

■Introduction of Tohoku University Technology (T19-673) Further evolution of wearable devices is expected through the performance improvement of transparent electrodes, which are semiconductor materials. ZnO is a representative conductive oxide, and its application to transparent electrodes is desired. Although thin film fabrication methods such as chemical vapor deposition (CVD), atomic layer deposition (ALD), and sputtering have been established, there has been a challenge in forming them on flexible substrates like resin without compromising conductivity. This invention enables the production of ZnO thin films with excellent conductivity and an unprecedented stable structure on PET by irradiating ZnO particles with electron beams.

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Tohoku University Technology: Polycrystalline Heusler alloy thin film: T20-2968

Polycrystalline Heusler alloy film exhibiting performance comparable to that for a single crystal, which can be formed on a flexible substrate

Co-based Heusler alloy such as Co2MnGa or Co2MnAl has attracted attention as candidate materials for high-sensitivity sensor and high-efficiency thermoelectric conversion element thanks to their large anomalous Nernst and Hall effects. In order to realize these excellent properties, it is thought that a single crystalline bulk material or a thin film grown on a single crystalline substrate is necessary. Thus, such single crystalline samples have been produced. Considering that those materials are applied to actual devices, it is necessary that a polycrystalline film, which does not use a single crystalline substrate, shows the property equivalent to those of single crystalline material.  This invention is able to provide a “polycrystalline Heusler alloy thin film" that does not require a single crystalline substrate, while showing the properties of anomalous Hall angle (θAH~7.5%) and anomalous Nernst coefficient (SANE~5μV/K) comparable to a single crystalline thin film. It can promote the control of crystal orientation and the improvement of crystallinity by sandwiching the polycrystalline layer with an insulating AlN layer.

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Tohoku University Technology: Novel High-Temperature Superconducting Thin Film: T22-032

Achieving magnetically isotropic superconducting properties that exhibit a critical temperature above that of liquid nitrogen under atmospheric pressure.

The development of "ambient pressure high-temperature superconducting compounds" that demonstrate superconductivity at temperatures above liquid nitrogen (−196℃) and under atmospheric pressure is actively pursued, aiming for applications in zero electrical resistance wire materials and powerful superconducting magnets. The copper oxide-based materials that have been commercialized so far exhibit significant magnetic anisotropy. Therefore, when applying them to wire materials, there has been the challenge of needing to control the crystal orientation of the material. This invention relates to magnetically isotropic ambient pressure high-temperature superconducting thin films. The key feature of this compound is that it is magnetically isotropic, eliminating the need for crystal orientation control. The right figure shows the temperature dependence of electrical resistance. Depending on the composition, it is evident that the critical temperature exceeds the liquid nitrogen temperature. Additionally, the right table presents the ratio of the upper critical magnetic field, which suggests magnetic isotropy as it shows a value close to 1. The compounds of this invention possess a high critical temperature and magnetically isotropic properties, making them suitable for the industrial fields mentioned in the applications below.

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Acid-resistant coating agent that works just by applying; free of regulated substances; transparent thin film.

Acid-resistant fluorine coating agent. Provides strong protection against acids from fuel cells and lithium batteries. Can be applied in-house. Does not use regulated substances.

The fluorine coating agent "Fluorosurf" forms a transparent fluororesin film at room temperature, exhibiting various benefits such as acid protection, water and oil repellency, prevention of grease rise (diffusion), fingerprint adhesion prevention, anti-soiling, lubrication, and release properties. 【Effective for the following applications!】 ■ Prevention of metal sulfide and oxidation ■ Protection of metals and resins from acids generated in fuel cells and lithium batteries. ■ Rust prevention for metals around batteries ■ Coating resistant to lithium electrolyte ■ Fingerprint adhesion prevention for displays and lenses ■ Prevention of oil leakage from miniature motors and spindle motor bearings ■ Stopping the flow of sealing resin ■ Insulating and moisture-proof coating for electric circuits ■ Prevention of leaks in electric circuits ■ Release agent for molds used in resin and elastomer molding 【Features】 ◯ A special fluororesin is dissolved in a non-flammable fluorine-based solvent to create a solution. ◯ Easy coating by brushing or dipping. Dries in 5 seconds to 15 minutes at room temperature. ◯ After drying, a transparent thin film of fluororesin is formed, demonstrating effectiveness in anti-soiling, water repellency, moisture resistance, etc. 〇 No use of PFAS regulated substances such as PFOS, PFOA, or PFHxS. *If you would like a free sample, please include "Sample Request" in your inquiry.

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